Pattern transfers

The aligner mask is a Midas MDA-400M that can operate with different contact modes (hard, vacuum, proximity). It allows transferring patterns to 3"- 4" diameter wafers and small substrates using 5" × 5" square photomasks. The illumination used is UV 365 nm. The dose and exposure time are computer controlled.

MicroWriter ML®3 system that offers resolutions (0.6 μm, 1 μm, 2 μm, and 5 μm) Works with files in CAD formats: CIF, BMP, TIFF, and GDSII that can be automatically selected through the software. The system allows you to create designs with a maximum writing area of 195 mm x 195 mm. It has a high-quality conjugate infinity optical microscope camera with Olympus 5x, 10x, and 20x lenses and yellow light illumination for the alignment of lithographic markers on the wafer (± 0.5μm alignment accuracy).

Nanonex NX-2000 Nanoprinter is a system for transferring nanometric patterns using the printing technique. It has the ability to print patterns with three-dimensional nanostructures and with a resolution of less than 10 nm. It includes all forms of nanoprinting, such as thermoplastic, heat curable, and direct (emboss) printing. It offers solutions to needs in various applications: optical devices, displays, data storage, biotechnology, semiconductor integrated circuits, chemical synthesis, and advanced materials.