Photoresist and HDMS

The Midas Spin-3000TD spinner allows spin speeds up to 7000 RPM, with time-controlled acceleration. Its dispenser system comprises two tanks and 3 nozzles that would enable the application of two chemicals, such as acetone and isopropyl alcohol, and carry out the drying process with nitrogen. Its interface with the user is through a touch screen.

PicoTrack PCT 150 RRE system allows functionalizing the surfaces of the samples with HMDS (Hexamethyldisilazane) to improve the adhesion of the photoresist. The system is fully automated and allows working with 4 and 6 inch wafers. It also provides annealing samples in a vacuum at temperatures up to 250 degrees Celsius.

This plate is used to evaporate solvents from photoresist film. Optimizing sample annealing can positively influence the later stages of manufacturing. During annealing, the thickness of the resin typically decreases by 25%. This process must be carried out on a smooth surface for good thermal contact and uniform heating. The heat treatment is usually carried out at a temperature between 90 and 120 ºC for approximately 60 seconds. The resin and the substrate type are vital factors to consider when developing a heating process.

To carry out the annealing and solvent evaporation process, the laboratory has an AS ONE brand Hot Plate that can be programmed from a computer.